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通过范德华外延中2D–3D异质界面调控实现石墨烯上AlN的晶圆级可剥离生长
2D–3D heterointerface regulation of van der Waals epitaxy of AlN on graphene for wafer-scale exfoliation
| 作者 | Peng Liu · Yiwei Duo · Wenze Wei · Jiaxin Liu · Qichao Yang · Jingnan Dong · Zhaolong Chen · Jiankun Yang · Yiyun Zhang · Peng Gao · Junxi Wang · Jingyu Sun · Wenjie Wang · Tongbo Wei |
| 期刊 | Applied Physics Letters |
| 出版日期 | 2026年2月 |
| 卷/期 | 第 128 卷 第 8 期 |
| 技术分类 | 功率器件技术 |
| 技术标签 | 宽禁带半导体 GaN器件 SiC器件 |
| 相关度评分 | ★★ 2.0 / 5.0 |
| 关键词 |
语言:
中文摘要
本文提出三步范德华外延法,在未处理双层石墨烯上生长可转移单晶AlN薄膜。通过首步超低V/III比保护石墨烯,第二步循环变比生长释放应变抑制开裂,最终实现晶圆级机械剥离。该方法为柔性深紫外器件提供高质量、可控剥离的AlN膜基础。
English Abstract
In this work, we present a three-step van der Waals epitaxy method to grow a transferable single-crystalline AlN membrane on untreated bilayer graphene by using two-dimensional (2D)/three-dimensional heterointerface regulation. Ultra-low V/III ratio in the first step greatly enables rapid mergence of quasi-2D AlN to protect the graphene from the damage in high-temperature and ammonia environments. Cyclic growth with different V/III ratios is introduced to release the strain in the second step, effectively alleviating the cracking problem of the subsequent AlN epilayer. Furthermore, we demonstrate the mechanical exfoliation of wafer-scale AlN epilayers and reveal the mechanism behind their controlled delamination. This work provides an effective strategy to realize free-standing AlN membrane on graphene with high quality and controllable delamination, laying a solid foundation for flexible deep ultraviolet device applications.
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SunView 深度解读
该研究聚焦AlN(氮化铝)在石墨烯上的范德华外延与剥离,属宽禁带半导体材料制备前沿,与阳光电源在SiC/GaN功率器件封装、高温高可靠性模块开发存在间接关联。虽不直接对应逆变器或PCS主电路,但AlN是高性能功率模块基板和封装绝缘层的关键材料(如ST系列PCS、PowerTitan中高频热管理需求),其晶圆级可控剥离技术有望提升器件热界面材料集成精度。建议关注AlN薄膜在功率模块DBC/AMB基板替代或先进封装中的潜在应用,协同高校开展热-电耦合可靠性验证。