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功率器件技术 宽禁带半导体 GaN器件 SiC器件 ★ 3.0

铜和镁掺杂β相氧化镓的X射线光电子能谱与光致发光研究

X-ray photoelectron spectroscopy and photoluminescence study of copper and magnesium doped beta-phase Ga2O3

作者 Edward Zhu · Chengyun Shou · Abdullah Almujtabi · Tianchen Yang · Quazi Sanjid Mahmud · Jianlin Liu
期刊 Applied Physics Letters
出版日期 2026年2月
卷/期 第 128 卷 第 8 期
技术分类 功率器件技术
技术标签 宽禁带半导体 GaN器件 SiC器件
相关度评分 ★★★ 3.0 / 5.0
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中文摘要

本文采用等离子体辅助分子束外延法在蓝宝石衬底上制备Mg、Cu单掺及共掺β-Ga2O3薄膜,XPS确认掺杂浓度并揭示价带态密度变化;PL测试显示无近带边发射,主导发光源于自陷空穴与VO/VGa–VO相关DAP跃迁,未观测到Mg/Cu受主发光。

English Abstract

Magnesium (Mg) doped, copper (Cu) doped, and Mg and Cu co-doped β-Ga2O3 thin film samples were grown on c-plane sapphire substrates using plasma-assisted molecular beam epitaxy. X-ray photoelectron spectroscopy analysis confirmed the doping concentrations. In addition, changes in the valence band density of states near the valence band maximum were revealed, while no Fermi-level shifts were observed in all doped samples, suggesting no electrical conductivity change compared to the undoped sample. Room-temperature photoluminescence (PL) characterization using an ArF laser of 193 nm excitation and subsequent PL peak deconvolution were performed. No near-band edge emissions were observed. The PL in each sample is dominated by optical transitions between the conduction band and self-trapped hole levels, and donor–acceptor pair transitions. These donors and acceptors originate from oxygen vacancies (VO) and gallium–oxygen vacancy complexes (VGa–VO), respectively. No visible transitions assignable to Mg and Cu acceptor levels could be extracted.
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SunView 深度解读

该研究聚焦β-Ga2O3这一新型超宽禁带半导体材料的掺杂与缺陷发光机制,虽非直接面向器件应用,但对理解Ga2O3中氧空位(VO)等本征缺陷行为具有参考价值。阳光电源在SiC/GaN功率器件可靠性研究中需关注类似缺陷对高压功率模块(如ST系列PCS中1500V+碳化硅功率单元)长期稳定性的影响。建议将此类基础缺陷物理成果纳入宽禁带器件失效分析模型,支撑组串式逆变器和PowerTitan储能系统中第三代半导体功率模块的寿命预测与热-电耦合设计优化。